Formula TiSi2 Density 4.02 g/cm³ Pubchem 6336889 | Molar mass 104.038 g/mol Melting point 1,470 °C | |
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Appearance black orthorhombic crystals | ||
Titanium disilicide (TiSi2) is an inorganic chemical compound.
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
References
Titanium disilicide Wikipedia(Text) CC BY-SA