Neha Patil (Editor)

Chemical Vapor Deposition (journal)

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Discipline
  
Materials science

Edited by
  
Peter Gregory

Publication history
  
1995-present

Language
  
English

Publisher
  
Wiley-VCH (Germany)

Abbreviated title (ISO 4)
  
'Chem. Vap. Deposition'

Chemical Vapor Deposition is a monthly peer-reviewed scientific journal covering materials science. It publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. Frequent topics covered by the journal also include inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

References

Chemical Vapor Deposition (journal) Wikipedia